We have deposited, in ultra-high vacuum conditions, hexadecafluoro copper phthalocyanine on to clean Si(111) 7 x 7 substrate and studied the organic-inorganic interface by means of monochromatic X-ray photoemission spectroscopy. The measurements, performed at various organic film thicknesses, show a strong interaction between the molecule and the silicon substrate. The presence of the 16 fluorine atoms at the outer structure of the planar molecule allows an easy detection of the chemisorption effects on the substrate. The results suggest the growth of a planar ultra-thin film of molecules on to the silicon surface. (C) 1998 Elsevier Science B.V. All rights reserved.

Hexadecafluoro-copper-phthalocyanine UHV deposited onto Si(111)7x7 substrate: an XPS study

OTTAVIANO, LUCA;LOZZI, Luca;
1998

Abstract

We have deposited, in ultra-high vacuum conditions, hexadecafluoro copper phthalocyanine on to clean Si(111) 7 x 7 substrate and studied the organic-inorganic interface by means of monochromatic X-ray photoemission spectroscopy. The measurements, performed at various organic film thicknesses, show a strong interaction between the molecule and the silicon substrate. The presence of the 16 fluorine atoms at the outer structure of the planar molecule allows an easy detection of the chemisorption effects on the substrate. The results suggest the growth of a planar ultra-thin film of molecules on to the silicon surface. (C) 1998 Elsevier Science B.V. All rights reserved.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11697/11128
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