In this work, the effects of nitrogen addition on the properties of a-C:H:F films produced by radio-frequency plasma enhanced chemical vapor deposition at different temperatures are reported. The structural and optical properties were investigated by X-ray photoelectron spectroscopy, Raman spectroscopy, UV-VIS transmittance and ellipsometry measurements. The main effect of progressive nitrogen incorporation is a decrease of transmittance of the optical band gap of the samples grown at room temperature and at 400degreesC. Raman spectra evidence that for films deposited at 400degreesC a sudden loss of sp(3) carbon bonding occurs. In particular, at fixed plasma composition the decrease of the optical band gap is interpreted as a clustering of the existing sp(2) carbon sites. Ellipsometry characterization indicates that films deposited at 400degreesC are characterized by a reduction of the refractive index. In particular, the increase in the deposition temperature produces an increase in the size of the graphitic clusters. (C) 2002 Elsevier Science Ltd. All rights reserved. RI Valentini, Luca/D-5238-2011; Kenny, Jose/F-9372-2010

Structural changes of fluorinated amorphous carbon films by nitrogen incorporation

LOZZI, Luca;SANTUCCI, Sandro
2002-01-01

Abstract

In this work, the effects of nitrogen addition on the properties of a-C:H:F films produced by radio-frequency plasma enhanced chemical vapor deposition at different temperatures are reported. The structural and optical properties were investigated by X-ray photoelectron spectroscopy, Raman spectroscopy, UV-VIS transmittance and ellipsometry measurements. The main effect of progressive nitrogen incorporation is a decrease of transmittance of the optical band gap of the samples grown at room temperature and at 400degreesC. Raman spectra evidence that for films deposited at 400degreesC a sudden loss of sp(3) carbon bonding occurs. In particular, at fixed plasma composition the decrease of the optical band gap is interpreted as a clustering of the existing sp(2) carbon sites. Ellipsometry characterization indicates that films deposited at 400degreesC are characterized by a reduction of the refractive index. In particular, the increase in the deposition temperature produces an increase in the size of the graphitic clusters. (C) 2002 Elsevier Science Ltd. All rights reserved. RI Valentini, Luca/D-5238-2011; Kenny, Jose/F-9372-2010
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11697/2297
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