A novel technique to lithograph the MoS<inf>2</inf> surface is described here. Mechanically exfoliated MoS<inf>2</inf> flakes have been patterned with an atomic force microscope tip. After the patterning process, the lithographed areas have been removed by selective chemical etching. The electronic properties of the MoS<inf>2</inf> flakes have been analyzed with spatially resolved photoelectron spectroscopy, with tunable incident photon energy, provided by a synchrotron light source. Tens of meV core level shifts can be recorded in relation to the flakes edges, coming from both the exfoliation and from the lithography.

Few layered MoS2 lithography with an AFM tip: description of the technique and nanospectroscopy investigations

GONCHIGSUREN, MUNKHSAIKHAN;DONARELLI, MAURIZIO;PERROZZI, FRANCESCO;BISTI, FEDERICO;OTTAVIANO, LUCA
2015

Abstract

A novel technique to lithograph the MoS2 surface is described here. Mechanically exfoliated MoS2 flakes have been patterned with an atomic force microscope tip. After the patterning process, the lithographed areas have been removed by selective chemical etching. The electronic properties of the MoS2 flakes have been analyzed with spatially resolved photoelectron spectroscopy, with tunable incident photon energy, provided by a synchrotron light source. Tens of meV core level shifts can be recorded in relation to the flakes edges, coming from both the exfoliation and from the lithography.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11697/121815
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