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EnglishA novel technique to lithograph the MoS<inf>2</inf> surface is described here. Mechanically exfoliated MoS<inf>2</inf> flakes have been patterned with an atomic force microscope tip. After the patterning process, the lithographed areas have been removed by selective chemical etching. The electronic properties of the MoS<inf>2</inf> flakes have been analyzed with spatially resolved photoelectron spectroscopy, with tunable incident photon energy, provided by a synchrotron light source. Tens of meV core level shifts can be recorded in relation to the flakes edges, coming from both the exfoliation and from the lithography.
| Titolo: | Few layered MoS<inf>2</inf> lithography with an AFM tip: description of the technique and nanospectroscopy investigations |
| Autori: | OTTAVIANO, LUCA (Corresponding) |
| Data di pubblicazione: | 2015 |
| Rivista: | |
| Handle: | http://hdl.handle.net/11697/121815 |
| Appare nelle tipologie: | 1.1 Articolo in rivista |
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http://hdl.handle.net/11697/121815
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