A novel technique to lithograph the MoS<inf>2</inf> surface is described here. Mechanically exfoliated MoS<inf>2</inf> flakes have been patterned with an atomic force microscope tip. After the patterning process, the lithographed areas have been removed by selective chemical etching. The electronic properties of the MoS<inf>2</inf> flakes have been analyzed with spatially resolved photoelectron spectroscopy, with tunable incident photon energy, provided by a synchrotron light source. Tens of meV core level shifts can be recorded in relation to the flakes edges, coming from both the exfoliation and from the lithography.
|Titolo:||Few layered MoS<inf>2</inf> lithography with an AFM tip: description of the technique and nanospectroscopy investigations|
OTTAVIANO, LUCA (Corresponding)
|Data di pubblicazione:||2015|
|Appare nelle tipologie:||1.1 Articolo in rivista|