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Titolo Data di pubblicazione Autore(i) File
UPS, XPS, AES studies on Te thin films deposited on Si(100)2x1 1-gen-1994 Di Nardo, S; Lozzi, Luca; Passacantando, M; Picozzi, P; Santucci, S.
THE INTERACTION OF CU(100)-FE SURFACES WITH OXYGEN STUDIED BY X-RAY PHOTOELECTRON-SPECTROSCOPY 1-gen-1994 Dendaas, H; Passacantando, Maurizio; Picozzi, P.; Santucci, Sandro; Lozzi, Luca
SIOX SURFACE STOICHIOMETRY BY XPS - A COMPARISON OF VARIOUS METHODS 1-gen-1994 Alfonsetti, R; Desimone, G; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro
OXIDATION OF THE FE/CU(100) INTERFACE 1-gen-1995 Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S; Dendaas, H.
ELECTRON-SPECTROSCOPY INVESTIGATION OF TE THIN-FILMS DEPOSITED AT ROOM-TEMPERATURE ON SI(100)2X1 1-gen-1995 Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro
EELFS AND EXFAS ELECTRON SPECTROSCOPIES - A COMBINED STRUCTURAL INVESTIGATION 1-gen-1995 Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro; Decrescenzi, M.
GROWTH OF TE THIN-FILMS DEPOSITED AT ROOM-TEMPERATURE ON THE SI(100)2X1 SURFACE 1-gen-1995 Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S.
THE USE OF THE AUGER PARAMETER IN THE CHARACTERIZATION OF SOME SILICON-COMPOUNDS 1-gen-1995 Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S.
AFM, XPS and XRD studies of W films growth by LPCVD onto TiN substrates 1-gen-1995 Santucci, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Grifoni, L; Diamanti, R; Moccia, G; Alfonsetti, R.
ELECTRONIC-PROPERTIES OF CRYSTALLINE AND AMORPHOUS SIO2 INVESTIGATED VIA ALL-ELECTRON CALCULATIONS AND PHOTOEMISSION SPECTROSCOPY 1-gen-1995 Dipomponio, A; Continenza, Alessandra; Lozzi, Luca; Passacantando, Maurizio; Santucci, Sandro; Picozzi, P.
REACTIVITY TOWARDS OXYGEN OF TE/SI(100) SURFACES INVESTIGATED BY ULTRAVIOLET PHOTOELECTRON-SPECTROSCOPY, X-RAY PHOTOELECTRON-SPECTROSCOPY AND LOW-ENERGY-ELECTRON DIFFRACTION SPECTROSCOPY 1-gen-1995 Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S.
EXFAS STUDIES ON THE THERMAL-BEHAVIOR OF COPPER SURFACE 1-gen-1995 Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro; Decrescenzi, M.
XPS analysis on SiO2 sol-gel thin films 1-gen-1995 Santucci, S.; Dinardo, S.; Lozzi, L.; Passacantando, Maurizio; Picozzi, P.
XPS, AES and leed studies of the interaction between the Si(100) 2x1 surface and cadmium deposited at room temperature 1-gen-1995 Santucci, S.; Dinardo, S.; Lozzi, L.; Passacantando, Maurizio; Picozzi, P.
Compositional characterization of very thin SiO2/Si3N4/SiO2 stacked films by XPS using the ''Auger parameter method'' 1-gen-1995 Santucci, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Alfonsetti, R; Fama, F; Moccia, G.
GROWTH OF TE THIN-FILMS DEPOSITED AT ROOM-TEMPERATURE ON THE SI(100)2X1 SURFACE 1-gen-1995 Dinardo, S; Lozzi, L; Passacantando, Maurizio; Picozzi, P; Santucci, S.
PRODUCTION AND CHARACTERIZATION OF MULTILAYER KCL-LIF THIN-FILMS ON GLASS 1-gen-1995 Somma, F; Ercoli, A; Santucci, Sandro; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P.
Investigation on the electronic structure of Fe deposited onto polycrystalline copper 1-gen-1996 Santucci, Sandro; Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P.
Influence of non-dipolar terms on the Cu L(2,3) and M(2,3) electron energy loss fine structure (EELFS) spectra in transmission and reflection mode 1-gen-1996 Diociaiuti, M; Lozzi, Luca; Passacantando, Maurizio; Santucci, S; Picozzi, P; Decrescenzi, M.
Microstructural effect on NO2 sensitivity of WO3 thin film gas sensors .1. Thin film devices, sensors and actuators 1-gen-1996 Sun, Ht; Cantalini, Carlo; Lozzi, Luca; Passacantando, Maurizio; Santucci, Sandro; Pelino, M.
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