Sfoglia per Autore
THE INTERACTION OF CU(100)-FE SURFACES WITH OXYGEN STUDIED BY X-RAY PHOTOELECTRON-SPECTROSCOPY
1994-01-01 Dendaas, H; Passacantando, Maurizio; Picozzi, P.; Santucci, Sandro; Lozzi, Luca
UPS AND XPS STUDIES OF CU CLUSTERS ON GRAPHITE
1994-01-01 Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro; Decrescenzi, M.
EXAFS LIKE OSCILLATIONS IN X-RAY EXCITED AUTOIONIZATION SPECTRA ASSISTED BY COMPTON PROCESS
1994-01-01 Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro; Decrescenzi, M.
1S SHAKE-UP EXCITATIONS IN NAF, NACL, NABR, AND NA2SO4
1994-01-01 Filipponi, Adriano; Passacantando, Maurizio; Lozzi, Luca; Santucci, S; Picozzi, P; Dicicco, A.
SIOX SURFACE STOICHIOMETRY BY XPS - A COMPARISON OF VARIOUS METHODS
1994-01-01 Alfonsetti, R; Desimone, G; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro
SURFACE STOICHIOMETRY DETERMINATION OF SIOXNY THIN-FILMS BY MEANS OF XPS
1994-01-01 Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S; Tomassi, G; Alfonsetti, R; Borghesi, A.
XPS analysis on SiO2 sol-gel thin films
1995-01-01 Santucci, S.; Dinardo, S.; Lozzi, L.; Passacantando, Maurizio; Picozzi, P.
REACTIVITY TOWARDS OXYGEN OF TE/SI(100) SURFACES INVESTIGATED BY ULTRAVIOLET PHOTOELECTRON-SPECTROSCOPY, X-RAY PHOTOELECTRON-SPECTROSCOPY AND LOW-ENERGY-ELECTRON DIFFRACTION SPECTROSCOPY
1995-01-01 Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S.
GROWTH OF TE THIN-FILMS DEPOSITED AT ROOM-TEMPERATURE ON THE SI(100)2X1 SURFACE
1995-01-01 Dinardo, S; Lozzi, L; Passacantando, M; Picozzi, P; Santucci, Sandro
THE USE OF THE AUGER PARAMETER IN THE CHARACTERIZATION OF SOME SILICON-COMPOUNDS
1995-01-01 Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S.
AFM, XPS and XRD studies of W films growth by LPCVD onto TiN substrates
1995-01-01 Santucci, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Grifoni, L; Diamanti, R; Moccia, G; Alfonsetti, R.
ELECTRONIC-PROPERTIES OF CRYSTALLINE AND AMORPHOUS SIO2 INVESTIGATED VIA ALL-ELECTRON CALCULATIONS AND PHOTOEMISSION SPECTROSCOPY
1995-01-01 Dipomponio, A; Continenza, Alessandra; Lozzi, Luca; Passacantando, Maurizio; Santucci, Sandro; Picozzi, P.
EELFS AND EXFAS ELECTRON SPECTROSCOPIES - A COMBINED STRUCTURAL INVESTIGATION
1995-01-01 Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro; Decrescenzi, M.
ELECTRON-SPECTROSCOPY INVESTIGATION OF TE THIN-FILMS DEPOSITED AT ROOM-TEMPERATURE ON SI(100)2X1
1995-01-01 Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro
XPS, AES and leed studies of the interaction between the Si(100) 2x1 surface and cadmium deposited at room temperature
1995-01-01 Santucci, S.; Dinardo, S.; Lozzi, L.; Passacantando, Maurizio; Picozzi, P.
GROWTH OF TE THIN-FILMS DEPOSITED AT ROOM-TEMPERATURE ON THE SI(100)2X1 SURFACE
1995-01-01 Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S.
GROWTH OF TE THIN-FILMS DEPOSITED AT ROOM-TEMPERATURE ON THE SI(100)2X1 SURFACE
1995-01-01 Dinardo, S; Lozzi, L; Passacantando, Maurizio; Picozzi, P; Santucci, S.
Compositional characterization of very thin SiO2/Si3N4/SiO2 stacked films by XPS using the ''Auger parameter method''
1995-01-01 Santucci, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Alfonsetti, R; Fama, F; Moccia, G.
PRODUCTION AND CHARACTERIZATION OF MULTILAYER KCL-LIF THIN-FILMS ON GLASS
1995-01-01 Somma, F; Ercoli, A; Santucci, Sandro; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P.
OXIDATION OF THE FE/CU(100) INTERFACE
1995-01-01 Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S; Dendaas, H.
Titolo | Data di pubblicazione | Autore(i) | File |
---|---|---|---|
THE INTERACTION OF CU(100)-FE SURFACES WITH OXYGEN STUDIED BY X-RAY PHOTOELECTRON-SPECTROSCOPY | 1-gen-1994 | Dendaas, H; Passacantando, Maurizio; Picozzi, P.; Santucci, Sandro; Lozzi, Luca | |
UPS AND XPS STUDIES OF CU CLUSTERS ON GRAPHITE | 1-gen-1994 | Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro; Decrescenzi, M. | |
EXAFS LIKE OSCILLATIONS IN X-RAY EXCITED AUTOIONIZATION SPECTRA ASSISTED BY COMPTON PROCESS | 1-gen-1994 | Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro; Decrescenzi, M. | |
1S SHAKE-UP EXCITATIONS IN NAF, NACL, NABR, AND NA2SO4 | 1-gen-1994 | Filipponi, Adriano; Passacantando, Maurizio; Lozzi, Luca; Santucci, S; Picozzi, P; Dicicco, A. | |
SIOX SURFACE STOICHIOMETRY BY XPS - A COMPARISON OF VARIOUS METHODS | 1-gen-1994 | Alfonsetti, R; Desimone, G; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro | |
SURFACE STOICHIOMETRY DETERMINATION OF SIOXNY THIN-FILMS BY MEANS OF XPS | 1-gen-1994 | Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S; Tomassi, G; Alfonsetti, R; Borghesi, A. | |
XPS analysis on SiO2 sol-gel thin films | 1-gen-1995 | Santucci, S.; Dinardo, S.; Lozzi, L.; Passacantando, Maurizio; Picozzi, P. | |
REACTIVITY TOWARDS OXYGEN OF TE/SI(100) SURFACES INVESTIGATED BY ULTRAVIOLET PHOTOELECTRON-SPECTROSCOPY, X-RAY PHOTOELECTRON-SPECTROSCOPY AND LOW-ENERGY-ELECTRON DIFFRACTION SPECTROSCOPY | 1-gen-1995 | Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S. | |
GROWTH OF TE THIN-FILMS DEPOSITED AT ROOM-TEMPERATURE ON THE SI(100)2X1 SURFACE | 1-gen-1995 | Dinardo, S; Lozzi, L; Passacantando, M; Picozzi, P; Santucci, Sandro | |
THE USE OF THE AUGER PARAMETER IN THE CHARACTERIZATION OF SOME SILICON-COMPOUNDS | 1-gen-1995 | Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S. | |
AFM, XPS and XRD studies of W films growth by LPCVD onto TiN substrates | 1-gen-1995 | Santucci, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Grifoni, L; Diamanti, R; Moccia, G; Alfonsetti, R. | |
ELECTRONIC-PROPERTIES OF CRYSTALLINE AND AMORPHOUS SIO2 INVESTIGATED VIA ALL-ELECTRON CALCULATIONS AND PHOTOEMISSION SPECTROSCOPY | 1-gen-1995 | Dipomponio, A; Continenza, Alessandra; Lozzi, Luca; Passacantando, Maurizio; Santucci, Sandro; Picozzi, P. | |
EELFS AND EXFAS ELECTRON SPECTROSCOPIES - A COMBINED STRUCTURAL INVESTIGATION | 1-gen-1995 | Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro; Decrescenzi, M. | |
ELECTRON-SPECTROSCOPY INVESTIGATION OF TE THIN-FILMS DEPOSITED AT ROOM-TEMPERATURE ON SI(100)2X1 | 1-gen-1995 | Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, Sandro | |
XPS, AES and leed studies of the interaction between the Si(100) 2x1 surface and cadmium deposited at room temperature | 1-gen-1995 | Santucci, S.; Dinardo, S.; Lozzi, L.; Passacantando, Maurizio; Picozzi, P. | |
GROWTH OF TE THIN-FILMS DEPOSITED AT ROOM-TEMPERATURE ON THE SI(100)2X1 SURFACE | 1-gen-1995 | Dinardo, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S. | |
GROWTH OF TE THIN-FILMS DEPOSITED AT ROOM-TEMPERATURE ON THE SI(100)2X1 SURFACE | 1-gen-1995 | Dinardo, S; Lozzi, L; Passacantando, Maurizio; Picozzi, P; Santucci, S. | |
Compositional characterization of very thin SiO2/Si3N4/SiO2 stacked films by XPS using the ''Auger parameter method'' | 1-gen-1995 | Santucci, S; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Alfonsetti, R; Fama, F; Moccia, G. | |
PRODUCTION AND CHARACTERIZATION OF MULTILAYER KCL-LIF THIN-FILMS ON GLASS | 1-gen-1995 | Somma, F; Ercoli, A; Santucci, Sandro; Lozzi, Luca; Passacantando, Maurizio; Picozzi, P. | |
OXIDATION OF THE FE/CU(100) INTERFACE | 1-gen-1995 | Lozzi, Luca; Passacantando, Maurizio; Picozzi, P; Santucci, S; Dendaas, H. |
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